PLASMA PROCESSING SYSTEM FOR CONTROLLING SPATIAL CHARACTERISTICS OF PLASMA USING RETROFITTED MAGNETIC FIELD CONFIGURATIONS
INDIAN INSTITUTE OF TECHNOLOGY DELHI
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Application No. :
202611028304
Filed :
10-03-2026
Published :
30-11--0001
Filed
A J.E PROBE ASSEMBLY FOR MEASURING POWER DEPOSITION IN A RADIO FREQUENCY (RF) PLASMA AND A METHOD THEREOF
INDIAN INSTITUTE OF TECHNOLOGY DELHI
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Patent No. :
588413
Filed :
22-01-2021
Published :
06-05-2026
Granted
A METHOD AND APPARATUS FOR ACCURATELY MONITORING POWER AND HARMONICS IN RF PLASMA SYSTEMS
INDIAN INSTITUTE OF TECHNOLOGY DELHI
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Patent No. :
508556
Filed :
04-11-2019
Published :
08-02-2024
Granted