Ministry of Education
Bablu Mukherjee
VIDWAN ID: 259096

Dr Bablu Mukherjee

Male Doctor of Philosophy
Senior Engineer
Telangana
Expertise: Nanoscience and Nanotechnology
ORCID 0000-0002-5625-5948 Scopus 56494131400 ResearcherID C-7203-2009 Google Scholar nGDnjbQAAAAJ
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43 Publications
1 Projects
1247 Scopus Citations
1213 CrossRef
9 Years 9 Months Total Experience
Publications
43 Total
Articles
32
Proceedings
11
Activity

No publication activity to display.

Scopus Scopus
1,247 Citations
17 h-index
CrossRef CrossRef
1,213 Citations
17 h-index
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Professional Recognition

DAAD
2009
German Academic Exchange Service
JSPS
2017
Japan Society for the Promotion of Science
Excellent Poster Presentation
2019
National Institute for Materials Science (NIMS)
Ramanujan Fellow
2022
Department of Science & Technology, Government of India

Community & Membership

Mendeley
Advisor
Jan 2010
Optical Society of India
F1311
Jan 2019
Japan Society of Applied Physics
M040941
Jan 2019

Personal Details

Doctor of Philosophy
2013
N/A
Master of Science
2009
N/A
Bachelor of Science
2007
N/A
Senior Engineer
Aug 2022 – Present
Unknown Organization
Senior Engineer
Sep 2020 – Jul 2022
Unknown Organization
Assistant Professor
May 2017 – Nov 2017
Vellore Institute of Technology, Vellore
Post-Doctoral Fellow
Sep 2015 – May 2017
Indian Institute of Technology, Bombay | Department of Electrical Engineering
Research Scientist
Mar 2014 – Aug 2015
Unknown Organization
Engineering and Technology
Nanoscience and Nanotechnology

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Scholarly Work

Development of highly sensitive optical sensor with two-dimensional atomic layers
Completed
Role: Principal Investigator Grant: 17F17360
Amount: ₹22 Lac
Duration: 2017 – 2019
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Methods and assemblies for depositing material in a gap

Ranjit Borude
Bablu Mukherjee
René Henricus Jozef Vervuurt
Viljami Pore
Takayoshi Tsutsumi
Nobuyoshi Kobayashi
Masaru Hori
- Patent No. : 18754246 Filed : 01-02-2025
Published : 30-11--0001 Filed

Methods for filling a gap and related systems and devices

Zecheng Liu
KIM Sunja
Viljami Pore
Jia Li Yao
Ranjit Borude
Bablu Mukherjee
René Henricus Jozef Vervuurt
Takayoshi Tsutsumi
Nobuyoshi Kobayashi
Masaru Hori
- Application No. : 17530983 Filed : 26-05-2022
Published : 30-11--0001 Filed

Etching processes and processing assemblies

US
- Application No. : 18143652 Filed : 01-04-2022
Published : 30-11-2023 Filed

Scholarly Publications

Multilayer ReS2 Photodetectors with Gate Tunability for High Responsivity and High-Speed Applications

Journal Article
ACS Applied Materials & Interfaces. Year: 2018. Volume: 10 , Issue: 42 , Pages: 36512-36522 .
Authors: Kartikey Thakar; Bablu Mukherjee; Sameer Grover; Naveen Kaushik; Mandar Deshmukh; Saurabh Lodha
DOI 10.1021/acsami.8b11248 Crossref Crossref: 112 Scopus Scopus: 112

Reversible hysteresis inversion in MoS2 field effect transistors

Open Access
Journal Article
npj 2D Materials and Applications. Year: 2017. Volume: 1 , Issue: 1 .
Authors: Naveen Kaushik; David M. A. Mackenzie; Kartikey Thakar; Natasha Goyal; Bablu Mukherjee; Peter Boggild; Dirch Hjorth Petersen; Saurabh Lodha
DOI 10.1038/s41699-017-0038-y Crossref Crossref: 164 Scopus Scopus: 170

Suspended ReSi FET for improved photocurrent-time response

Conference Paper
Year: 2017.
Authors: Bablu Mukherjee; Kartikey Thakar; Naveen Kaushik; Saurabh Lodha
DOI 10.1109/DRC.2017.7999439 Crossref Crossref: 3 Scopus Scopus: 4

Exciton Emission Intensity Modulation of Monolayer MoS2 via Au Plasmon Coupling

Open Access
Journal Article
Scientific Reports. Year: 2017. Volume: 7 .
Authors: B. Mukherjee; N. Kaushik; Ravi P. N. Tripathi; A. M. Joseph; P. K. Mohapatra; S. Dhar; B. P. Singh; G. V. Pavan Kumar; E. Simsek; S. Lodha
DOI 10.1038/srep41175 Crossref Crossref: 55 Scopus Scopus: 55

Electrical and photoresponse properties of Co 3O 4 nanowires

Open Access
Conference Paper
Journal of Applied Physics. Year: 2012. Volume: 111 , Issue: 10 .
Authors: Binni Varghese; Bablu Mukherjee; K. R. G. Karthik; K. B. Jinesh; S. G. Mhaisalkar; Eng Soon Tok; Chorng Haur Sow
DOI 10.1063/1.4712497 Crossref Crossref: 48 Scopus Scopus: 51

Topographically-selective atomic layer etching of SiO<sub>2</sub> usingradical fluorination of the surface followed by Ar ion bombardment

Open Access
Journal Article
Japanese Journal of Applied Physics. Year: 2023. Volume: 62 , Issue: 12 , Pages: 121001 .
Authors: Airah Peraro Osonio; Takayoshi TSUTSUMI; Bablu Mukherjee; Ranjit Borude; Nobuyoshi Kobayashi; Masaru HORI
DOI 10.35848/1347-4065/ad0c46 Crossref Crossref: 7 Scopus Scopus: 7

Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent

Journal Article
Journal of Vacuum Science & Technology A. Year: 2022. Volume: 40 , Issue: 6 , Pages: 062601 .
Authors: Airah P. Osonio; Takayoshi Tsutsumi; Yoshinari Oda; Bablu Mukherjee; Ranjit Borude; Nobuyoshi Kobayashi; Masaru Hori
DOI 10.1116/6.0002044 Crossref Crossref: 7 Scopus Scopus: 7

Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure

Journal Article
Langmuir. Year: 2021. Volume: 37 , Issue: 43 , Pages: 12663-12672 .
Authors: R.H.J. Vervuurt; B. Mukherjee; K. Nakane; T. Tsutsumi; M. Hori; N. Kobayashi
DOI 10.1021/acs.langmuir.1c02036 Crossref Crossref: 6 Scopus Scopus: 6
Showing 25 to 32 of 43 publications