Authors: Long Wen; Bibhuti B. Sahu; Geun Y. Yeom; Jeon G. Han
Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process
Authors: Shin, K.S.; Sahu, B.B.; Han, J.G.; Hori, M.
Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency plasma enhanced chemical vapor deposition